Patent · US Active

Methods of manufacturing large-area sputtering targets using interlocking joints

US9293306B2 · kind B2 · utility

0Cited by
193References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 8, 2015
Grant dateMar 22, 2016
Priority date
Expiry dateJul 8, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/10
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.