Tunnel field effect transistor (TFET) with lateral oxidation
US9293591B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2011 |
| Grant date | Mar 22, 2016 |
| Priority date | — |
| Expiry date | Sep 20, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/165
Abstract
A vertical-mode tunnel field-effect transistor (TFET) is provided with an oxide region that may be laterally positioned relative to a source region. The oxide region operates to reduce a tunneling effect in a tunnel region underlying a drain region, during an OFF-state of the TFET. The reduction in tunneling effect results in a reduction or elimination of a flow of OFF-state leakage current between the source region and the drain region. The TFET may have components made from group III-V compound materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.