Hole blocking layer and method for producing same, and photoelectric conversion element comprising the hole blocking layer and method for manufacturing same
US9293721B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2010 |
| Grant date | Mar 22, 2016 |
| Priority date | — |
| Expiry date | Feb 28, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Provided is a hole-blocking layer which has excellent basic characteristics such as high photoelectric conversion efficiency, while exhibiting excellent productivity. The hole-blocking layer is produced by a process that has a step of bringing an aqueous solution containing hydrogen peroxide and titanium (IV) oxysulfate into contact with the surface of a member on which the hole-blocking layer is to be formed, and holding the contact between the aqueous solution and the member at 50 to 120° C., so that an amorphous titanium oxide precursor precipitates on the surface of the member; and a step of drying the amorphous titanium oxide precursor that has precipitated on the member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.