Doping and reduction of nanostructures and thin films through flame annealing
US9296621B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Mar 28, 2014 |
| Grant date | Mar 29, 2016 |
| Priority date | — |
| Expiry date | Mar 28, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/16
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A sol-flame method includes 1) forming a sol-gel precursor solution of a source of a dopant; 2) coating a nanostructure or a thin film with the sol-gel precursor solution; and 3) subjecting the coated nanostructure or the coated thin film to flame annealing to form a doped nanostructure or a doped thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.