Patent · US Active

Semiconductor lasers and etched-facet integrated devices having non-uniform trenches

US9306373B2 · kind B2 · utility

1Cited by
5References
18Claims
0Family size

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Key dates

Filing dateFeb 15, 2013
Grant dateApr 5, 2016
Priority date
Expiry dateJun 28, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S5/343
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An edge-emitting etched-facet optical semiconductor structure includes a substrate, an active multiple quantum well (MQW) region formed on the substrate, a ridge waveguide formed over the MQW region extending in substantially a longitudinal direction between a waveguide first etched end facet disposed in a first window and a waveguide second etched end facet disposed in a second window, and first and second trenches having non-uniform widths extending in substantially the longitudinal direction between the first and second windows.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.