Method of measuring flatness of chamfering table
US9310176B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 28, 2014 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Dec 12, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B3/1094
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of measuring a flatness of a chamfering table includes the steps of positioning a substrate on the chamfering table, chamfering an edge of the substrate a plurality of times with a chamfering wheel while varying a relative height of the chamfering wheel with respect to a height of the substrate, locating symmetric chamfered points where the chamfered edge is top-bottom symmetric, matching values of the relative height of the chamfering wheel to the found symmetric chamfered points, and obtaining the flatness of the chamfering table from the values of the relative height of the chamfering wheel that are matched to the symmetric chamfered points.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.