Antireflective film comprising large particle size fumed silica
US9310527B2 · kind B2 · utility
0Cited by
11References
16Claims
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Assignee
Inventors
Key dates
| Filing date | Feb 17, 2012 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Jun 27, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249992
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Antireflective films are described comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate. The low refractive index layer comprises the reaction product of polymerizable resin composition comprising at least 20 wt-% fumed silica. In one embodiment, the polymerizable resin is ethylenically unsaturated. In a favored embodiment, the low refractive index layer increases in porosity from the light transmissive substrate interface to an opposing porous surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.