Organometallic solution based high resolution patterning compositions
US9310684B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 22, 2013 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Aug 22, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.