Vapor phase chemical mechanical polishing of magnetic recording disks
US9312141B2 · kind B2 · utility
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16References
16Claims
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Key dates
| Filing date | Nov 21, 2013 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Dec 5, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3212
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for polishing a carbon overcoat of a magnetic media that results in a smooth surface free of carbon cluster debris. The method involves forming a magnetic disk having a carbon overcoat formed thereon. The carbon overcoat is then polished in the presence of ozone (O3). The heat from the polishing process along with the presence of the ozone, cause any carbon particles removed by the polishing to form CO2 gas so that there is no remaining carbon particle debris on the surface of the disk.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.