Metallic contact for optoelectronic semiconductor device
US9312448B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2013 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Jul 12, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/835
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A contact to a semiconductor layer in a light emitting structure is provided. The contact can include a plurality of contact areas formed of a metal and separated by a set of voids. The contact areas can be separated from one another by a characteristic distance selected based on a set of attributes of a semiconductor contact structure of the contact and a characteristic contact length scale of the contact. The voids can be configured to increase an overall reflectivity or transparency of the contact.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.