Patent · US Active

Metallic contact for optoelectronic semiconductor device

US9312448B2 · kind B2 · utility

25Cited by
4References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 12, 2013
Grant dateApr 12, 2016
Priority date
Expiry dateJul 12, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/835
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A contact to a semiconductor layer in a light emitting structure is provided. The contact can include a plurality of contact areas formed of a metal and separated by a set of voids. The contact areas can be separated from one another by a characteristic distance selected based on a set of attributes of a semiconductor contact structure of the contact and a characteristic contact length scale of the contact. The voids can be configured to increase an overall reflectivity or transparency of the contact.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.