Patent · US Active

Photoreactive monomers

US9315445B2 · kind B2 · utility

2Cited by

0References

4Claims

0Family size

Assignee

BASF SE

Inventors

Dieter Urban · Speyer, DE
Ulrike Licht · Mannheim, DE
Christopher Barner-Kowollik · Blankenloch, DE
Guillaume Delaittre · Mannheim, DE
Elena Frick · Karlsruhe, DE

Key dates

Filing date	Sep 9, 2013
Grant date	Apr 19, 2016
Priority date	—
Expiry date	Sep 18, 2033

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC07C67/29
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

Photoreactive monomer which has (i) at least one free-radically polymerizable C—C double bond, (ii) at least one hydrophilic group selected from an ethylene glycol group and a polyethylene glycol group having at least 2 ethylene glycol units and (iii) at least one photoreactive group, the photoreactive group being a photoenolizable carbonyl group, and also a method for preparing the photoreactive monomers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.