Method for the production of layers containing indium oxide

US9315901B2 · kind B2 · utility

Assignee

• EVONIK DEGUSSA GMBH · DE

Inventors

• Juergen Steiger · Taipei, TW
• Duy Vu Pham · Oberhausen, DE
• Heiko Thiem · Bensheim, DE
• Alexey Merkulov · Ludwigshafen, DE
• Arne Hoppe · Herne, DE

Key dates

• Filing date: Aug 13, 2010
• Grant date: Apr 19, 2016
• Expiry date: Dec 31, 2032

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C18/1258
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present invention relates to a liquid phase process for producing indium oxide-containing layers from nonaqueous solution, in which an anhydrous composition containing at least one indium oxo alkoxide of the generic formula MxOy(OR)z[O(R′O)cH]aXb[R″OH]d where x=3-25, y=1-10, z=3-50, a=0-25, b=0-20, c=0-1, d=0-25, M=In, R, R′, R″=organic radical, X=F, Cl, Br, I and at least one solvent are applied to a substrate, optionally dried, and converted to an indium oxide-containing layer, to the layers producible by the process according to the invention and to the use thereof.