Exposure apparatus and exposure method using the same
US9316923B2 · kind B2 · utility
1Cited by
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16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2011 |
| Grant date | Apr 19, 2016 |
| Priority date | — |
| Expiry date | May 27, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7015
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are an exposure apparatus and an exposure method using the same. The exposure apparatus includes: a light source unit configured to emit light; a substrate stage supporting a substrate, the substrate comprising an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.