High-speed micro-hole fabrication in glass
US9321680B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2012 |
| Grant date | Apr 26, 2016 |
| Priority date | — |
| Expiry date | Jul 3, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/1213
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for fabricating a high-density array of holes in glass comprises providing a glass sheet having a front surface and irradiating the glass sheet with a laser beam so as to produce open holes extending into the glass sheet from the front surface of the glass sheet. The beam creates thermally induced residual stress within the glass around the holes, and after irradiating, the glass sheet is annealed to eliminate or reduce thermal stress caused by the step of irradiating. The glass sheet is then etched to produce the final hole size. Preferably, the glass sheet is also annealed before the step of irradiating, at sufficiently high temperature for a sufficient time to render the glass sheet dimensionally stable during the step of annealing after irradiating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.