Optical measuring system and method of measuring critical size
US9322640B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2013 |
| Grant date | Apr 26, 2016 |
| Priority date | — |
| Expiry date | Jun 28, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Optical measuring systems for measuring geometrical parameters of nano-objects and methods of measuring a critical size (CS) are provided. The optical method of measuring the CS includes selecting parameters of an optic scheme and an illumination condition; recording a set of nanostructure images corresponding to various wavelengths with various defocusing levels of scattered radiation; calculating a plurality of sets of images of a nanostructure with various defocusing levels, corresponding to various wavelengths of the scattered radiation with CS values within a known range; and comparing a set of measured images of the nanostructure with the sets of the calculated images and determining a best approximate value of the CS values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.