Particle manipulation system and projection device
US9323039B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 2013 |
| Grant date | Apr 26, 2016 |
| Priority date | — |
| Expiry date | Aug 23, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B21/28
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A particle manipulation system and a projection device are provided. The projection device includes an image source and a projection lens. The image source provides an image beam. The projection lens is disposed on a light path of the image beam and includes a zoom lens set and a focusing lens set. The zoom lens set is disposed on the light path of the image beam from the image source and includes at least two lens groups disposed in sequence on the light path of the image beam. The focusing lens set is disposed on the light path of the image beam. The zoom lens set is disposed between the image source and the focusing lens set. A photoconductor chip is disposed on the light path of the image beam from the projection lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.