Generating guiding patterns for directed self-assembly
US9330228B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 22, 2015 |
| Grant date | May 3, 2016 |
| Priority date | — |
| Expiry date | Apr 22, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Aspects of the disclosed technology relate to techniques of generating guiding patterns for via-type feature groups. A guiding pattern is constructed based on seeding positions for a via-type feature group. The initial seeding positions are derived from targeted locations of via-type features in the via-type feature group. A potential energy function is then determined for the guiding pattern. Based on the potential energy function, simulated locations of the via-type features are computed. The seeding positions are compared with the targeted locations and may be adjusted based on differences between the simulated locations and the targeted locations. The above operations may be repeated until one of one or more termination conditions are met.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.