Plasma generation device with microstrip resonator
US9330889B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2013 |
| Grant date | May 3, 2016 |
| Priority date | — |
| Expiry date | Jan 21, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generation device, a system including a plasma generation device, and a method of generating plasma and vacuum UV (VUV) photons are described. In a representative embodiment, plasma generation device, includes: a substrate having a first surface and a second surface; a resonant ring-shaped structure disposed over the first surface of the substrate, the resonant ring-shaped structure having dimensions selected to support at least one standing wave having more than one electric field maximum along a length of the resonant ring-shaped structure; a ground plane disposed on the second surface of the substrate; and an apparatus configured to provide a gas at locations of the electric field maxima.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.