Patent · US Active

Photosensitive resin composition and black spacer using the same

US9334399B2 · kind B2 · utility

0Cited by
46References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 28, 2013
Grant dateMay 10, 2016
Priority date
Expiry dateOct 28, 2033

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L2312/06
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Disclosed are a photosensitive resin composition including (A) a thermally curing initiator having a half-life of about one hour at a temperature ranging from about 100 to about 150° C.; (B) a photopolymerization initiator; (C) a binder resin; (D) a photopolymerizable compound; (E) a colorant; and (F) a solvent, and a black spacer using the same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.