Patent · US Active

Method for sputter targets for electrolyte films

US9334557B2 · kind B2 · utility

47Cited by
603References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 19, 2008
Grant dateMay 10, 2016
Priority date
Expiry dateMar 16, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Alternative sputter target compositions or configurations for thin-film electrolytes are proposed whereby the sputter target materials system possesses sufficient electrical conductivity to allow the use of (pulsed) DC target power for sputter deposition. The electrolyte film materials adopt their required electrically insulating and lithium-ion conductive properties after reactive sputter deposition from the electrically conducting sputter target materials system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.