Apparatus for evaluating quality of crystal, and method and apparatus for manufacturing semiconductor light-emitting device including the apparatus
US9334582B2 · kind B2 · utility
174Cited by
48References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2015 |
| Grant date | May 10, 2016 |
| Priority date | — |
| Expiry date | Jan 22, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/0137
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for evaluating the quality of a crystal includes an optical device that measures a surface reflectance of a wafer in which a V-pit is formed; and a data processing unit that calculates a threading dislocation density by calculating a difference in surface reflectance of the wafer that is measured by the optical device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.