MEMS device with non-planar features
US9340415B2 · kind B2 · utility
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5References
15Claims
0Family size
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Key dates
| Filing date | Mar 18, 2015 |
| Grant date | May 17, 2016 |
| Priority date | — |
| Expiry date | Mar 18, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0198
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A MEMS device is formed with facing surfaces of a contoured substrate and a layer of material having complementary contours. In one fabrication approach, a first photoresist layer is formed over a substrate. Selected regions of the first photoresist layer are exposed using a patterning mask. The exposed regions of the first photoresist layer are thermally shrunk to pattern the first photoresist layer with a contour. A layer of material is formed over the contoured first photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.