Patent · US Active

Transparent glass substrate and process for manufacturing such a substrate

US9340453B2 · kind B2 · utility

3Cited by
5References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 22, 2010
Grant dateMay 17, 2016
Priority date
Expiry dateApr 26, 2033

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24612
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

This transparent glass substrate has at least one face which is provided with a texturing formed by a plurality of geometric features in relief relative to a general plane of the face, this texturing being adapted in order to ensure a transmission of radiation through the substrate greater than the transmission of radiation through a substrate that is identical but lacks texturing. The face of the substrate is also provided with an antireflection layer having a refractive index between the refractive index of air and the refractive index of the glass. The antireflection layer is an etched out superficial portion of the glass substrate on the side of the face, which comprises a structure based on silica and voids having a characteristic dimension between 0.5 nanometers and 50 nanometers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.