Transparent glass substrate and process for manufacturing such a substrate
US9340453B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2010 |
| Grant date | May 17, 2016 |
| Priority date | — |
| Expiry date | Apr 26, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24612
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
This transparent glass substrate has at least one face which is provided with a texturing formed by a plurality of geometric features in relief relative to a general plane of the face, this texturing being adapted in order to ensure a transmission of radiation through the substrate greater than the transmission of radiation through a substrate that is identical but lacks texturing. The face of the substrate is also provided with an antireflection layer having a refractive index between the refractive index of air and the refractive index of the glass. The antireflection layer is an etched out superficial portion of the glass substrate on the side of the face, which comprises a structure based on silica and voids having a characteristic dimension between 0.5 nanometers and 50 nanometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.