Photopatternable materials and related electronic devices and methods
US9341948B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2014 |
| Grant date | May 17, 2016 |
| Priority date | — |
| Expiry date | Aug 25, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0758
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Described herein is a solution-processable composition for preparing a photopatternable material. The solution-processable composition generally includes (a) an oligomeric siloxane component that includes, based on its total weight, between about 40% by weight and about 100% by weight one or more cage-structured polyhedral oligomeric silsesquioxanes that are functionalized with one or more crosslinkable moieties such as cycloaliphatic epoxy moieties, (b) a polymerization initiator; (c) one or more thermosettable polymers that collectively are present in an amount between about 1% by weight and about 20% by weight based on the total weight of the oligomeric siloxane component; and (d) a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.