Photosensitive compositions and applications thereof
US9341949B2 · kind B2 · utility
1Cited by
0References
30Claims
0Family size
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Key dates
| Filing date | Apr 25, 2014 |
| Grant date | May 17, 2016 |
| Priority date | — |
| Expiry date | Apr 25, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/181
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are resistant to thermo-oxidative chain degradation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.