Nanoimprint lithography for thin film heads
US9343089B2 · kind B2 · utility
1Cited by
6References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 8, 2013 |
| Grant date | May 17, 2016 |
| Priority date | — |
| Expiry date | Mar 8, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/887
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Nanoimprint lithography can be used in a variety of ways to improve resolution, pattern fidelity and symmetry of microelectronic structures for thin film head manufacturing. For example, write poles, readers, and near-field transducers can be manufactured with tighter tolerances that improve the performance of the microelectronic structures. Further, entire bars of thin film heads can be manufactured simultaneously using nanoimprint lithography, which reduces or eliminated alignment errors between neighboring thin film heads in a bar of thin film heads.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.