Device and method for coating a substrate using CVD

US9343337B2 · kind B2 · utility

Assignees

• DIACCON GMBH · DE
• CemeCon AG · DE

Inventors

• Martin Rueffer · Amberg, DE
• Stefan Rosiwal · Bamberg, DE
• Christian Bareiss · Aachen, DE
• Walter Reichert · Wantage, US
• Oliver Lemmer · Aachen, DE
• Marc Perle · Forchheim, DE

Key dates

• Filing date: Nov 13, 2009
• Grant date: May 17, 2016
• Expiry date: Feb 5, 2033

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C30B29/06
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conductors extending between a first (1) and a second electrode (6), wherein the heat conductors are held individually tensioned by a weight (4) attached to one end thereof. To increase the life of the neat conductors (2), the invention proposes that the weight (4) or the heat conductor (2) be guided at the second electrode (6), forming an electrical loop contact, in such a way that a vector of the weight force (G) produced by the weight (4) makes an angle (α) of no more than 45° with a direction of the longitudinal extension of the heat conductor (2).