Waveguide-based apparatus for exciting and sustaining a plasma
US9345121B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2014 |
| Grant date | May 17, 2016 |
| Priority date | — |
| Expiry date | Jul 19, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01P3/127
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus includes an electromagnetic which supports propagation of an electromagnetic wave in a first direction between a first end thereof and a second end thereof, and an electromagnetic-field shaping structure within the electromagnetic waveguide. The electromagnetic-field shaping structure defines a channel extending from a first aperture in a first wall of the apparatus to a second aperture in a second, opposite, wall. The channel has an axis extending in a second direction which is nonparallel with the first direction. The distance between the first aperture and the second aperture in the second direction is less than the width of the interior region of the waveguide at the first and second ends thereof. In some embodiments, a plasma torch is disposed within the channel. The length of the torch closely matches its interaction region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.