Exposure apparatus and method of manufacturing device
US9348235B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 7, 2014 |
| Grant date | May 24, 2016 |
| Priority date | — |
| Expiry date | Aug 7, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus projects an image of a pattern formed on a mask onto a substrate through a projection optical system. The exposure apparatus includes: a prediction unit configured to predict an imaging characteristic fluctuation of the projection optical system which is caused by thermal action due to exposure, by using a model formula modeling the imaging characteristic fluctuation; and a correction unit configured to correct the imaging characteristic based on a prediction result obtained by the prediction unit. The model formula includes a composition of a plurality of functions modeling the imaging characteristic fluctuation and indicating a time dependency, each of the plurality of functions having an exposure-angle-of-view dependency and the exposure-angle-of-view dependencies of the plurality of functions being different from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.