Lift mechanism for a glass substrate in an exposure machine
US9352943B2 · kind B2 · utility
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Key dates
| Filing date | Jun 25, 2013 |
| Grant date | May 31, 2016 |
| Priority date | — |
| Expiry date | Nov 14, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lift mechanism for a glass substrate in an exposure machine is provided, which comprises a base, a lift platform mounted on the top of the base and used to lift the glass substrate, lift bars mounted on the perimeter of the base, and at least one adsorbing devices mounted above the glass substrate; the lift bars are used to lift the perimeter of the glass substrate; each of the adsorbing devices is used to adsorb the upper surface of the substrate and able to move along the vertical direction and the horizontal direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.