Process for manufacturing silicon-based nanoparticles from metallurgical-grade silicon or refined metallurgical-grade silicon
US9352969B2 · kind B2 · utility
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Key dates
| Filing date | Mar 9, 2012 |
| Grant date | May 31, 2016 |
| Priority date | — |
| Expiry date | Jul 21, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/36
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A process for manufacturing silicon-based nanoparticles by electrochemical etching of a substrate, wherein the substrate is a metallurgical-grade or upgraded metallurgical-grade silicon, the substrate including an impurity content greater than 0.01%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.