Patent · US Active

Block copolymer and pattern forming method using the same

US9354522B2 · kind B2 · utility

3Cited by
6References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 22, 2014
Grant dateMay 31, 2016
Priority date—
Expiry dateAug 22, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/3081
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.