Laser source apparatus and laser microscope
US9356413B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 24, 2012 |
| Grant date | May 31, 2016 |
| Priority date | — |
| Expiry date | Sep 24, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0092
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is a laser source apparatus including a single laser source that emits an ultrashort-pulse laser beam; a wavelength conversion mechanism that generates a plurality of pulsed laser beams having different wavelengths by converting at least a part of wavelength of the ultrashort-pulse laser beam; a dispersion adjusting section that adjusts the amount of frequency dispersion for each of the pulsed laser beams; and an introducing optics that emits the plurality of pulsed laser beams whose frequency dispersion amounts are adjusted by the dispersion adjusting section. The dispersion adjusting section adjusts the amount of frequency dispersion for each of the pulsed laser beams so that each of the pulsed laser beams introduced to the irradiation optics of the optical apparatus from the introducing optics to excite a specimen is close to a substantially Fourier-transform-limited pulse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.