Feeder system and method for a vapor transport deposition system
US9359668B2 · kind B2 · utility
2Cited by
39References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2012 |
| Grant date | Jun 7, 2016 |
| Priority date | — |
| Expiry date | May 25, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/228
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An improved feeder system and method for a vapor transport deposition system that includes a carrier gas bypass flow line to allow for continuous carrier gas flow to a vaporizer unit when a vibratory unit which supplies powdered material and carrier gas to the vaporizer unit is out of service. A process gas flow line to the vibratory unit may be included when the powdered material contains a powdered dopant in the material mix.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.