Imprinting stamp and nano-imprinting method using the same
US9360751B2 · kind B2 · utility
1Cited by
6References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 14, 2012 |
| Grant date | Jun 7, 2016 |
| Priority date | — |
| Expiry date | Sep 22, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/887
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.