Patent · US Active

Media etch process

US9361926B2 · kind B2 · utility

0Cited by

6References

14Claims

0Family size

Assignee

HGST Netherlands, B.V. · NL

Inventors

Qing Dai · San Jose, US
Oleksandr Mosendz · San Jose, US
Simone Pisana · San Jose, US
James W. Reiner · Palo Alto, US
Hans J. Richter · Palo Alto, US
Franck Dreyfus Rose · San Jose, US
Dieter K. Weller · San Jose, US

Key dates

Filing date	May 10, 2013
Grant date	Jun 7, 2016
Priority date	—
Expiry date	May 28, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG11B5/674
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

A method for etching a media is disclosed. A first magnetic layer comprising grains is deposited with a segregant such that a portion of the first segregant covers a top surface of the grains of the first magnetic layer and a second portion of the first segregant separates the grains of the first magnetic layer. The first segregant is etched to remove the portion of the first segregant that covers the top surface of the grains.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.