Patent · US Active

Micromachined on-wafer probes and related method

US9366697B2 · kind B2 · utility

1Cited by
27References
27Claims
0Family size

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Key dates

Filing dateMay 20, 2011
Grant dateJun 14, 2016
Priority date
Expiry dateJun 2, 2032

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R3/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A micromachining process to fabricate a single chip that simple drops into a supporting structure. The micromachining process provides the ability to create a probe that will interface with integrated circuits, for example, operating at frequencies in the range of about 100 GHz to about 3,000 GHz (3 THz). This approach creates a silicon structure (or other applicable choice of material) that provides mechanical force for probing while supporting the transfer of the high frequency energy between a measurement system and the integrated circuit, individual device or material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.