Photopolymer formulation having triazine-based writing monomers

US9366957B2 · kind B2 · utility

Assignee

• Covestro Deutschland AG · DE

Inventors

• Thomas Rölle · Leverkusen, DE
• Friedrich-Karl Bruder · Krefeld, DE
• Thomas Fäcke · Leverkusen, DE
• Marc-Stephan Weiser · Leverkusen, DE
• Dennis Hönel · Wichterich, DE

Key dates

• Filing date: Jan 28, 2011
• Grant date: Jun 14, 2016
• Expiry date: Jan 28, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03H2260/12
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

The invention relates to a photopolymer formulation comprising polyurethane matrix polymers, writing monomers, and photoinitiators, wherein the writing monomers comprise compounds of formula (I), where R1, R2, R3 independent of each other are each a halogen atom or an organic radical, wherein at least one of the radicals is an organic radical comprising a radiation hardening group. The invention further relates to the use of the photopolymer formulation for producing holographic media.