Patent · US Active

Compositions and antireflective coatings for photolithography

US9366964B2 · kind B2 · utility

0Cited by
17References
17Claims
0Family size

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Key dates

Filing dateAug 28, 2012
Grant dateJun 14, 2016
Priority date—
Expiry dateSep 14, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G77/80
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A composition comprising:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.