Method of conducting an X-ray diffraction-based crystallography analysis
US9372163B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Jan 28, 2014 |
| Grant date | Jun 21, 2016 |
| Priority date | — |
| Expiry date | Jun 26, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20075
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of X-ray diffraction-based analysis for determining the structure of a crystal sample is provided. The method comprises conducting pre-experiment to collect a first set of diffraction images including reflections at corresponding intensities. The method also comprises conducting a main experiment to collect a second set of diffraction images, the diffraction images of the second set including the reflections with higher relative intensities than those produced during the first experiment, at least some of the diffraction images of the second set including topped reflections resulting from detector saturation. The method also includes a step of replacing intensities of the topped reflections from the second set of images with intensities obtained for the corresponding reflections from the first set of images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.