Production method for optical component and optical component
US9372285B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2012 |
| Grant date | Jun 21, 2016 |
| Priority date | — |
| Expiry date | Jun 30, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0841
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for manufacturing a light transmissive optical component, includes a first etching process of forming a depressed portion by applying etching to a silicon region of a plate-shaped member, a thermal oxidation process of forming a silicon oxide film by thermally oxidizing an inner side surface of the depressed portion, and a nitride film formation process of forming a silicon nitride film that covers the silicon oxide film. Accordingly, it is possible to realize a manufacturing method for an optical component which is capable of uniformly forming a silicon oxide film on a semi-transmissive reflecting surface which is largely inclined (or nearly vertical) with respect to a substrate surface, and an optical component produced by this method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.