Alignment of single-mode polymer waveguide (PWG) array and silicon waveguide (SIWG) array of providing adiabatic coupling
US9372305B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 2013 |
| Grant date | Jun 21, 2016 |
| Priority date | — |
| Expiry date | Aug 8, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12147
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating, and a structure embodying, a single-mode polymer wave guide array aligned with a polymer waveguide array through adiabatic coupling. The present invention provides a structure having a combination of (i) a stub fabricated on a polymer and (ii) a groove fabricated on a silicon (Si) chip, with which an adiabatic coupling can be realized by aligning (a) a (single-mode) polymer waveguide (PWG) array fabricated on the polymer with (b) a silicon waveguide (SiWG) array fabricated on the silicon chip; wherein, the stub fabricated on the polymer is patterned according to a nano-imprint process, along with the PWG array, in a direction in which the PWG array is fabricated, and the groove fabricated on the silicon chip is fabricated along a direction in which the SiWG array is fabricated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.