Molecular organometallic resists for EUV

US9372402B2 · kind B2 · utility

Assignee

• The Research Foundation for The State University of New York · US

Inventors

• Daniel Freedman · Red Hook, US
• Miles Marnell · Rochester, US
• Robert L. Brainard · Albany, US
• Brian J. Cardineau · Corvallis, US

Key dates

• Filing date: Sep 13, 2013
• Grant date: Jun 21, 2016
• Expiry date: Feb 23, 2034

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/2982
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Described herein are organometallic or inorganic complexes with high extreme ultraviolet (EUV) optical density (OD) and high mass density for use in thin films. These thin films are used as high resolution, low line edge roughness (LER) EUV photoresists. The complexes may also be included in nanoparticle form for use in photoresists.