Method for manufacturing a treated surface and vacuum plasma sources
US9376747B2 · kind B2 · utility
0Cited by
10References
16Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 1, 2007 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | May 17, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32541
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
When treating workpiece or substrate surfaces with the help of a vacuum plasma discharge between an anode and an cathode and whereby due to such treatment a solid is formed and deposited on the anode surface, which solid has a higher specific DC impedance than the specific DC impedance of the anode material, at least parts of the anode surface are shielded from such deposition by establishing thereat a shielding plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.