Imprint template with optically-detectable alignment marks and method for making using block copolymers
US9377683B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2013 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | Oct 23, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method using directed self-assembly of block copolymers (BCPs) for making an imprint template has the required patterns for both the features in the template's active area and the optically-detectable alignment marks in the template's non-active area. A chemical contrast pattern defined by a lithographic technique forms patterns of lines in both the active area and non-active area, as well as patterns of featureless gap regions in the non-active area. The pattern of lines has the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of featureless gap regions has the BCP components aligned as lamellae parallel to the substrate. The patterns of lines and featureless gap regions in the non-active area define the optically detectable alignment marks. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate the imprint template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.