Antireflective films comprising microstructured surface
US9383482B2 · kind B2 · utility
4Cited by
35References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 3, 2011 |
| Grant date | Jul 5, 2016 |
| Priority date | — |
| Expiry date | Apr 29, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0242
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention concerns antireflective films comprising a high refractive index layer (60) and low refractive index layer (80) disposed on the high refractive index layer. The antireflective films have a microstructured surface (70) that can be derived from a microreplicated tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.