CMOS imaging device having optimized shape, and method for producing such a device by means of photocomposition
US9385149B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 5, 2013 |
| Grant date | Jul 5, 2016 |
| Priority date | — |
| Expiry date | Jul 5, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/124
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An imaging device comprises a sensor of surface area of at least 10 cm2 and comprising: an image zone produced on a single substrate and comprising a group of pixels disposed in rows and columns, the number of pixels per column not being uniform for all the columns of pixels, each pixel collecting electric charges generated by a photosensitive element, row conductors linking the pixels row by row, column conductors linking the pixels column by column, row addressing blocks linked to the row conductors to address each row of pixels individually, and column reading blocks linked to the column conductors to read the electric charges collected by the pixels of the row selected by the row addressing blocks, the column reading blocks being situated at the periphery of the image zone; the row addressing blocks and the column reading blocks being produced on the same substrate as the image zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.