Synthesis of graphene by chemical vapor deposition
US9388048B1 · kind B1 · utility
28Cited by
2References
19Claims
0Family size
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Key dates
| Filing date | Oct 8, 2009 |
| Grant date | Jul 12, 2016 |
| Priority date | — |
| Expiry date | Nov 28, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B2204/04
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods, materials and apparatus are described for synthesizing a monolayer or few-layers of graphene. Depositing the graphene can include, in some implementations, flowing hydrogen and carbon feedstock over a catalytic layer formed on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.