Patent · US Active

Compositions for controlled assembly and improved ordering of silicon-containing block copolymers

US9388326B2 · kind B2 · utility

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19Claims
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Assignee

Inventors

Key dates

Filing dateSep 9, 2015
Grant dateJul 12, 2016
Priority date
Expiry dateSep 9, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/31144
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.