Methods of making patterned structures of materials, patterned structures of materials, and methods of using same
US9389511B2 · kind B2 · utility
7Cited by
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14Claims
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Key dates
| Filing date | Mar 19, 2012 |
| Grant date | Jul 12, 2016 |
| Priority date | — |
| Expiry date | Apr 29, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24851
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.